Thin Film Measurement

Thin film measurement by spectral reflectometry and ellipsometry

Thin Films: Thin films are material layers deposited on a surface of another material. They are an essential element in many industrial processes, for example, in semiconductor processes or optical coatings. The thickness of such films range usually from less than a nanometer (10 Å) to several hundred micrometers. To perform their desired functions, thin films must have the appropriate thickness, composition, and other important characteristicsts. These properties must be measured frequently.
Optical methods are usually the preferred method for thin film measurement. They are accurate, non-contact and nondestructive. The most two common methods are spectral reflectance and ellipsometry.

Both methods share the same physics and theory with their own specific features and applications.

Ellipsometry    Reflectometry
2 # of independent variables 1
+ works without reference -
+ ability to measure very thin films -
+ long term stability -
o measurement and analysis speed +
o costs +

Principle of spectral ellipsometry and reflectometry

Examples for thin film measurements