Both spectroscopic ellipsometers and reflectometers are extremely useful for thin film analysis. At omt, our goal is to provide our customers with the optimized device for their needs, to simplify the handling of these devices, and to make state-of-the-art measurement analysis using the easiest procedures available.
In general, ellipsometry is a technique that is incorporated in highly sophisticated R&D laboratories for determining n&k for multilayer systems and thicknesses of very thin films. Reflectometry, on the other hand, is used for more common laboratory applications and because of its ruggedness, short acquisition times and insensitivity to sample positioning, for online industrial applications. However the choice of the proper device is very application dependent and often requires expert background knowledge.
To determine which device best satisfies your needs, use the table given below. For further assistance and to identify the proper device for your application, please contact omt.
